離子轟擊清洗工藝就是利用氣體放電原理，將工件放置在氣體放電形成的等離子體中，通過放電粒子對工件表面進行轟擊。氣體等離子中包含的正離子、負離子、中性粒子、自由電子、光子和自由基等粒子，通過控制氣體放電過程使等離子體轟擊工件，可以消除表面附著的一些低分子物質，使其被電離、離解或解吸；同時其中一些高能載荷粒子所具有的豐富化學活性可以引起表面的物理形貌和化學結構的變化，使工件得到表面刻蝕和活化作用。

顯然，離(li)子轟(hong)擊清洗工藝(yi)完(wan)全不同于(yu)(yu)液體清洗，是一種比較理(li)想(xiang)的(de)“干式清洗”處理(li)過程，具有(you)明顯的(de)綠色環保工藝(yi)技術特(te)點。可以(yi)對金屬、塑料、玻璃等(deng)材料表(biao)(biao)(biao)面(mian)(mian)進行除油(you)、活化、清洗處理(li)，在(zai)薄(bo)膜沉積(ji)、半導體、紡織、精密機(ji)械等(deng)領域得到(dao)了較好的(de)應(ying)用。在(zai)鍍膜前通過離(li)子轟(hong)擊工件，其轟(hong)擊能量(liang)可傳遞給基底(di)的(de)晶格原(yuan)子，使晶格結構遭到(dao)破(po)壞，增加工件表(biao)(biao)(biao)面(mian)(mian)的(de)微觀粗糙度(du)，使基底(di)的(de)表(biao)(biao)(biao)面(mian)(mian)原(yuan)子徹底(di)裸露，提高原(yuan)子的(de)極(ji)化率(lv)，縮小了薄(bo)膜原(yuan)子與(yu)(yu)基底(di)表(biao)(biao)(biao)面(mian)(mian)原(yuan)子的(de)間距，同時(shi)增加薄(bo)膜與(yu)(yu)表(biao)(biao)(biao)面(mian)(mian)的(de)接觸面(mian)(mian)積(ji)，有(you)利于(yu)(yu)提高機(ji)械鎖緊力，從而極(ji)大地改善薄(bo)膜與(yu)(yu)基底(di)間的(de)附著力。

氣體放電理論(lun)

氣(qi)體放(fang)電(dian)(dian)(dian)(dian)(dian)(dian)(dian)(dian)(dian)現(xian)(xian)象(xiang)既可以發(fa)(fa)生(sheng)(sheng)(sheng)在(zai)(zai)低氣(qi)壓狀態，也可以發(fa)(fa)生(sheng)(sheng)(sheng)在(zai)(zai)大氣(qi)壓或較高(gao)(gao)氣(qi)壓狀態環境 下，但是壓力越高(gao)(gao)氣(qi)體放(fang)電(dian)(dian)(dian)(dian)(dian)(dian)(dian)(dian)(dian)越困難，需要更高(gao)(gao)的(de)(de)(de)激(ji)發(fa)(fa)電(dian)(dian)(dian)(dian)(dian)(dian)(dian)(dian)(dian)壓或特殊的(de)(de)(de)放(fang)電(dian)(dian)(dian)(dian)(dian)(dian)(dian)(dian)(dian)環境；如大氣(qi)壓 的(de)(de)(de)電(dian)(dian)(dian)(dian)(dian)(dian)(dian)(dian)(dian)弧放(fang)電(dian)(dian)(dian)(dian)(dian)(dian)(dian)(dian)(dian)、火花放(fang)電(dian)(dian)(dian)(dian)(dian)(dian)(dian)(dian)(dian)、介質阻(zu)擋(dang)放(fang)電(dian)(dian)(dian)(dian)(dian)(dian)(dian)(dian)(dian)等等。在(zai)(zai)真空環境中，當引入的(de)(de)(de)高(gao)(gao)壓電(dian)(dian)(dian)(dian)(dian)(dian)(dian)(dian)(dian)場(chang)加(jia)載(zai)在(zai)(zai)一定氣(qi) 壓范(fan)圍內的(de)(de)(de)氣(qi)體上時，產生(sheng)(sheng)(sheng)氣(qi)體放(fang)電(dian)(dian)(dian)(dian)(dian)(dian)(dian)(dian)(dian)現(xian)(xian)象(xiang)。氣(qi)體分子和電(dian)(dian)(dian)(dian)(dian)(dian)(dian)(dian)(dian)子碰(peng)撞電(dian)(dian)(dian)(dian)(dian)(dian)(dian)(dian)(dian)離是氣(qi)體放(fang)電(dian)(dian)(dian)(dian)(dian)(dian)(dian)(dian)(dian)產生(sheng)(sheng)(sheng)的(de)(de)(de) 主導因素(su)，自由電(dian)(dian)(dian)(dian)(dian)(dian)(dian)(dian)(dian)子被外電(dian)(dian)(dian)(dian)(dian)(dian)(dian)(dian)(dian)場(chang)加(jia)速，電(dian)(dian)(dian)(dian)(dian)(dian)(dian)(dian)(dian)子與氣(qi)體分子、原子發(fa)(fa)生(sheng)(sheng)(sheng)碰(peng)撞、能量轉移，產生(sheng)(sheng)(sheng) 激(ji)發(fa)(fa)或電(dian)(dian)(dian)(dian)(dian)(dian)(dian)(dian)(dian)離，向(xiang)高(gao)(gao)能態躍(yue)遷。

氣體發(fa)生(sheng)放(fang)(fang)電的(de)(de)(de)類型和方式(shi)較多，常見的(de)(de)(de)有電暈(yun)放(fang)(fang)電、輝光放(fang)(fang)電、火花放(fang)(fang)電、電弧 放(fang)(fang)電等放(fang)(fang)電現(xian)象，這些放(fang)(fang)電現(xian)象在(zai)不同的(de)(de)(de)條件下可以(yi)發(fa)生(sheng)相互轉換。在(zai)一定電壓的(de)(de)(de)電場 作用下，放(fang)(fang)電氣體產生(sheng)的(de)(de)(de)帶電粒子作定向運(yun)動，生(sheng)成放(fang)(fang)電電流。

氣體(ti)放(fang)電(dian)等離子(zi)體(ti)中的(de)活性粒子(zi)與材料發生反應(ying)生成揮(hui)發性氣體(ti)被真空泵(beng)抽走便是離子(zi)轟擊清洗的(de)主要(yao)原理(li)。